Kaijo to show megasonic cleaning tech at Semicon West 2026

Kaijo Shibuya America Inc. will exhibit at Semicon West 2026 in San Francisco from Oct. 13-15, 2026, highlighting megasonic, Water Resonance, and single-wafer cleaning systems at booth 1948. The company says the lineup is aimed at wafer and substrate cleaning where particle removal and repeatability are critical.

Why it matters: - Semiconductor cleaning performance can affect yield, repeatability, and contamination control across wafer and substrate processing. - Kaijo is using Semicon West 2026 to position its cleaning systems for semiconductor, electronics, automotive, aerospace, and medical device production.

What happened: - Kaijo Shibuya America Inc. will exhibit at Semicon West 2026 in San Francisco on Oct. 13-15, 2026. - The booth will be in South Hall at Moscone Center, booth #1948. - The display will feature advanced megasonics, the Water Resonance System, and single-wafer cleaning technologies.

The details: - Kaijo says the exhibit is aimed at wafer and substrate cleaning applications where particle removal and repeatability matter most. - The company’s systems are sized and tuned to the substrate, contaminant, and required throughput. - Kaijo says the systems are designed with attention to chemical use and energy draw. - The advanced megasonics lineup includes Quava megasonic generators. - Kaijo says the Quava family delivers high-power, precision particle removal from delicate substrates. - The Quava systems use frequency, waveform, and power settings matched to the application. - The Water Resonance System is described as ultrasonic industrial cleaning equipment that provides uniform cavitation for three-dimensional cleaning in large tank volumes. - Kaijo says the Water Resonance System can increase cavitation energy by up to 500%. - The single-wafer lineup includes Quava Spot Shower, Quava Mega Puck Flow, Mega Tube, and Mega Wedge. - Kaijo says those systems are built for silicon wafer and mask processing and are designed to hold consistent cleaning results piece-to-piece. - Michael Danese, president of Kaijo Shibuya America Inc., said the company’s megasonic cleaners use unique operation modes for delicate substrate cleaning and that the Water Resonance System maintains uniform cavitation across large tanks. - Danese also said the single-wafer product set holds cleaning results steady wafer after wafer. - Kaijo’s application list includes semiconductor and electronics uses such as silicon wafer cleaning, mask cleaning, PCB assembly contamination removal, HDD media processing, and flat-panel glass cleaning. - The company also lists automotive and aerospace cleaning for grease, carbon deposits, and residue removal from critical components. - Medical and pharmaceutical applications include sterile cleaning of surgical instruments and lab equipment. - General manufacturing applications include cleaning molds, machined parts, and sensitive industrial components. - For more information about Kaijo's ultrasonic and megasonic cleaning systems, visit more information.

Between the lines: - Kaijo is framing the booth around process control and repeatability, two priorities that matter to semiconductor fabs and advanced manufacturing customers. - The emphasis on multiple product families suggests the company wants to show coverage across batch, tank, and single-wafer cleaning use cases rather than a single niche product. - The technology mix also signals a push to connect semiconductor cleaning with adjacent industries that share contamination-control needs.

What's next: - Kaijo will present the systems in person at Semicon West 2026 during the Oct. 13-15 show window. - The company is directing interested visitors to booth #1948 in South Hall at Moscone Center. - Kaijo Shibuya America Inc. is based in Santa Clara, California, and serves North America through direct work with process engineers, manufacturing engineers, and facilities managers.

The bottom line: - Kaijo is using Semicon West 2026 to pitch a broad cleaning portfolio built around precision, repeatability, and application-specific tuning.